Liquid-Phase Epitaxy (LPE) is a technique used in the bulk growth of crystals, typically in semiconductor manufacturing, whereby the crystal is grown from a rich solution of the semiconductor onto a substrate in layers, each of which is formed by supersaturation or cooling. At least 50% of growth in the optoelectronics area is currently focussed on LPE. This book covers the bulk growth of semiconductors, i.e. silicon, gallium arsenide, cadmium mercury telluride, indium phosphide, indium antimonide, gallium nitride, cadmium zinc telluride, a range of wide-bandgap II-VI compounds, diamond and silicon carbide, and a wide range of oxides/fluorides (including sapphire and quartz) that are used in many industrial applications. A separate chapter is devoted to the fascinating field of growth in various forms of microgravity, an activity that is approximately 30-years old and which has revealed many interesting features, some of which have been very surprising to experimenters and theoreticians alike. Covers the most important materials within the field The contributors come from a wide variety of countries and include both academics and industrialists, to give a balanced treatment Builds-on an established series known in the community Highly pertinent to current and future developments in telecommunications and computer-processing industries.

Liquid-Phase Epitaxy (LPE) is a technique used in the bulk growthof crystals, typically in semiconductor manufacturing, whereby thecrystal is grown from a rich solution of the semiconductor onto asubstrate in layers, each of which is formed by supersaturation orcooling. At least 50% of growth in the optoelectronics area iscurrently focussed on LPE.This book covers the bulk growth of semiconductors, i.e.silicon, gallium arsenide, cadmium mercury telluride, indiumphosphide, indium antimonide, gallium nitride, cadmium zinctelluride, a range of wide-bandgap II-VI compounds, diamond andsilicon carbide, and a wide range of oxides/fluorides (includingsapphire and quartz) that are used in many industrial applications.A separate chapter is devoted to the fascinating field of growth invarious forms of microgravity, an activity that is approximately30-years old and which has revealed many interesting features, someof which have been very surprising to experimenters andtheoreticians alike.* Covers the most important materials within the field* The contributors come from a wide variety of countries andinclude both academics and industrialists, to give a balancedtreatment* Builds-on an established series known in the community* Highly pertinent to current and future developments intelecommunications and computer-processing industries.

Series Preface.Preface.Acknowledgements.List of Contributors.1. Introduction to Liquid Phase Epitaxy (Hans J. Scheel)2. Liquid Phase Epitaxy in Russia Prior to 1990 (V.A.Mishurnyi)3. Phase Diagrams and Modeling in Liquid Phase Epitaxy (KazuoNakajima)4. Equipment and Instrumentation for Liquid Phase Epitaxy(Michael G. Mauk and James B. McNeely)5. Silicon, Germanium and Silicon-Germanium Liquid Phase Epitaxy(Michael G. Mauk)6. Liquid Phase Epitaxy of Silicon Carbide (R. Yakimova and M.Syvajarvi)7. Liquid Phase Epitaxy of Gallium Nitride (Hans J. Scheel andDennis Elwell)8. Liquid Phase Epitaxy of Quantum Wells and Quantum Dots (A.Krier, X.L. Huang and Z. Labadi)9. Liquid Phase Epitaxy of Hg1-x CDx Te(MCT) (P. Capper)10. Liquid Phase Epitaxy of Widegap II-VIs (J.F. Wang and M.Isshiki)11. Liquid Phase Epitaxy of Garnets (Taketoshi Hibiya and PeterGornert)12. Liquid Phase Epitaxy: A Survey of Capabilities, RecentDevelopments and Specialized Applications (Michael G. Mauk)13. Liquid Phase Epitaxy for Light Emitting Diodes (Michael G.Mauk)Index.