A practical guide to semiconductor manufacturing from process control to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Control covers all issues involved in manufacturing microelectronic devices and circuits, including fabrication sequences, process control, experimental design, process modeling, yield modeling, and CIM/CAM systems. Readers are introduced to both the theory and practice of all basic manufacturing concepts. Following an overview of manufacturing and technology, the text explores process monitoring methods, including those that focus on product wafers and those that focus on the equipment used to produce wafers. Next, the text sets forth some fundamentals of statistics and yield modeling, which set the foundation for a detailed discussion of how statistical process control is used to analyze quality and improve yields. The discussion of statistical experimental design offers readers a powerful approach for systematically varying controllable process conditions and determining their impact on output parameters that measure quality. The authors introduce process modeling concepts, including several advanced process control topics such as run-by-run, supervisory control, and process and equipment diagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and management of overall manufacturing systems * Chapters include case studies, sample problems, and suggested exercises * Instructor support includes electronic copies of the figures and an instructor's manual Graduate-level students and industrial practitioners will benefit from the detailed exami?nation of how electronic materials and supplies are converted into finished integrated circuits and electronic products in a high-volume manufacturing environment. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department. An Instructor Support FTP site is also available.

A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental designFundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process controlexperimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts.Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields.The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling conceptsincluding several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis.Critical coverage includes the following:* Combines process control and semiconductor manufacturing* Unique treatment of system and software technology and managementof overall manufacturing systems* Chapters include case studies, sample problems, and suggestedexercises* Instructor support includes electronic copies of the figures andan instructor's manualGraduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment.An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment.An Instructor Support FTP site is also available.

Preface.Acknowledgments.1. Introduction to Semiconductor Manufacturing.Objectives.Introduction.1.1. Historical Evolution.1.2. Modern Semiconductor Manufacturing.1.3. Goals of Manufacturing.1.4. Manufacturing Systems.1.5. Outline for Remainder of the Book.Summary.Problems.References.2. Technology Overview.Objectives.Introduction.2.1. Unit Processes.2.2. Process Integration.Summary.Problems.References.3. Process Monitoring.Objectives.Introduction.3.1. Process Flow and Key Measurement Points.3.2. Wafer State Measurements.3.3. Equipment State Measurements.Summary.Problems.References.4. Statistical Fundamentals.Objectives.Introduction.4.1. Probability Distributions.4.2. Sampling from a Normal Distribution.4.3. Estimation4.4. Hypothesis Testing.Summary.Problems.Reference.5. Yield Modeling.Objectives.Introduction.5.1. Definitions of Yield Components.5.2. Functional Yield Models.5.3. Functional Yield Model Components.5.4. Parametric Yield.5.5. Yield Simulation.5.6. Design Centering.5.7. Process Introduction and Time-to-Yield.Summary.Problems.References.6. Statistical Process Control.Objectives.Introduction.6.1. Control Chart Basics.6.2. Patterns in Control Charts.6.3. Control Charts for Attributes.6.4. Control Charts for Variables.6.5. Multivariate Control.6.6. SPC with Correlated Process Data.Summary.Problems.References.7. Statistical Experimental Design.Objectives.Introduction.7.1. Comparing Distributions.7.2. Analysis of Variance.7.3. Factorial Designs.7.4. Taguchi Method.Summary.Problems.References.8. Process Modeling.Objectives.Introduction.8.1. Regression Modeling.8.2. Response Surface Methods.8.3. Evolutionary Operation.8.4. Principal-Component Analysis.8.5. Intelligent Modeling Techniques.8.6. Process Optimization.Summary.Problems.References.9. Advanced Process Control.Objectives.Introduction.9.1. Run-by-Run Control with Constant Term Adaptation.9.2. Multivariate Control with Complete Model Adaptation.9.3. Supervisory Control.Summary.Problems.References.10. Process and Equipment Diagnosis.Objectives.Introduction.10.1. Algorithmic Methods.10.2. Expert Systems.10.3. Neural Network Approaches.10.4. Hybrid Methods.Summary.Problems.References.Appendix A: Some Properties of the Error Function.Appendix B: Cumulative Standard Normal Distribution.Appendix C: Percentage Points of the chi2Distribution.Appendix D: Percentage Points of the tDistribution.Appendix E: Percentage Points of the FDistribution.Appendix F: Factors for Constructing Variables ControlCharts.Index.