Hideo Ikegami is Professor Emeritus of both Nagoya University and National Institute for Fusion Science in Nagoya, Japan. His primary interest is basic plasma physics and various plasma applications. In 1996, he created a consulting company of plasma application technology, Technowave Inc., and served as president. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).
 
Noriyoshi Sato has worked in research and education on plasma physics and is now Professor Emeritus at Tohoku University, Japan. His primary interest is basic plasma behaviour related to various plasma applications. He is elevating his works in collaboration with companies. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).
 
Akihisa Matsuda is Special Guest Professor at the Graduate School of Engineering Science of Osaka Univeristy, Japan, since 2007, after being Director of Research Initiative for Thin Film Silicon Solar Cells at the National Institute of Advanced Industrial Science and Technology (AIST), Japan. His main field of interest are plasma-process diagnostics and process control for thin film silicon solar cells.
 
Kiichiro Uchino is currently Professor at the Department of Applied Science for Electronics and Materials at Kyushu University in Fukuoka, Japan. He is working on laser-aided diagnostics of plasmas and various industrial plasma applications.
 
Masayuki Kuzuya is currently the Dean of College of Pharmaceutical Sciences, and Professor of Pharmaceutical Physical Chemistry at Matsuyama University, Japan. His research interest is in the field of fundamental studies of organic plasma chemistry and its bio- and pharmaceutical applications.
 
Akira Mizuno is Professor of the Department of Ecological Engineering at Toyohashi University of Technology. His research includes applied electrostatics and high-voltage engineering, which includes electrostatic precipitation, environmental application of plasma, sterilization and other environmental friendly technologies as well as manipulation and measurement of single DNA molecules. He is editor of the International Journal of Plasma Environmental Science and Technology.
 
Yoshinobu Kawai works as Research Professor at Interdisciplinary Graduate School of Engineering Sciences at Kyushu University, Japan, since 1974. He is expert in production of large diameter plasma in the frequency range from VHF to microwave for amorphous and microcrystalline silicon solar cell and etching. He is one of the editors of Advanced Plasma Technology (Wiley-VCH, 2007).

INTRODUCTION TO PLASMAS
ENVIRONMENTAL APPLICATION OF NONTHERMAL PLASMA
ATMOSPHERIC PLASMA AIR POLLUTION CONTROL, SOLID WASTE, AND WATER TREATMENT TECHNOLOGIES: FUNDAMENTAL AND OVERVIEW
OPTICAL DIAGNOSTICS FOR HIGH-PRESSURE NONTHERMAL PLASMA ANALYSIS
LASER INVESTIGATIONS OF FLOW PATTERNS IN ELECTROSTATIC PRECIPITATORS AND NONTHERMAL PLASMA REACTORS
WATER PLASMAS FOR ENVIRONMENTAL APPLICATION
CHEMISTRY OF ORGANIC POLLUTANTS IN ATMOSPHERIC PLASMAS
GENERATION AND APPLICATION OF WIDE AREA PLASMA
NONTHERMAL PLASMA-BASED SYSTEM FOR EXHAUST TREATMENT UNDER REDUCED ATMOSPHERE OF PYROLYSIS GASES
PHARMACEUTICAL AND BIOMEDICAL ENGINEERING BY PLASMA TECHNIQUES
TARGETING DENDRITIC CELLS WITH CARBON MAGNETIC NANOPARTICLES MADE BY DENSE-MEDIUM PLASMA TECHNOLOGY
APPLICATIONS OF PULSED POWER AND PLASMAS TO BIOSYSTEMS AND LIVING ORGANISMS
APPLICATIONS OF PLASMA POLYMERIZATION IN BIOMATERIALS
PLASMA STERILIZATION AT NORMAL ATMOSPHERIC PRESSURE
ELIMINATION OF PATHOGENIC BIOLOGICAL RESIDUALS BY MEANS OF LOW-PRESSURE INDUCTIVELY COUPLED PLASMA DISCHARGE
STERILIZATION AND PROTEIN TREATMENT USING OXYGEN RADICALS PRODUCED BY RF DISCHARGE
HYDROPHILICITY AND BIOACTIVITY OF A POLYETHYLENE TEREPHTHALATE SURFACE MODIFIED BY PLASMA-INITIATED GRAFT POLYMERIZATION
STRATEGIES AND ISSUES ON THE PLASMA PROCESSING OF THIN-FILM SILICON SOLAR CELLS
CHARACTERISTICS OF VHF PLASMA WITH LARGE AREA
DEPOSITION OF A-SI : H FILMS WITH HIGH STABILITY AGAINST LIGHT EXPOSURE BY REDUCING DEPOSITION OF NANOPARTICLES FORMED IN SIH4 DISCHARGES
DIAGNOSTICS AND MODELING OF SIH4/H2 PLASMAS FOR THE DEPOSITION OF MICROCRYSTALLINE SILICON: THE CASE OF DUAL-FREQUENCY SOURCES
INTRODUCTION TO DIAMOND-LIKE CARBONS
DIAMOND-LIKE CARBON FOR APPLICATIONS
APPLICATIONS OF DLCS TO BIOPROCESSING
PLASMA PROCESSING OF NANOCRYSTALLINE SEMICONDUCTIVE CUBIC BORON NITRIDE THIN FILMS
FUNDAMENTALS ON TRIBOLOGY OF PLASMA-DEPOSITED DIAMOND-LIKE CARBON FILMS
DIAMOND-LIKE CARBON THIN FILMS GROWN IN PULSED-DC PLASMAS
PLASMA DEPOSITION OF N-TIO2 THIN FILMS
INVESTIGATION OF DLC AND MULTILAYER COATINGS HYDROPHOBIC CHARACTER FOR BIOMEDICAL APPLICATIONS
CREATION OF NOVEL ELECTROMAGNETIC AND REACTIVE MEDIA FROM MICROPLASMAS
NANOBLOCK ASSEMBLY USING PULSE RF DISCHARGES WITH AMPLITUDE MODULATION
THOMSON SCATTERING DIAGNOSTICS OF DISCHARGE PLASMAS
CRYSTALLIZED NANODUST PARTICLES GROWTH IN LOW-PRESSURE COLD PLASMAS
COLLECTION AND REMOVAL OF FINE PARTICLES IN PLASMA CHAMBERS

Clearly structured in five major sections on applications, this monograph covers such hot technologies as nanotechnology, solar cell technology, biomedical and clinical applications, and sustainability.
Since the topic, applications and readers are highly interdisciplinary, the book bridges materials science, industrial chemistry, physics, and engineering -- making it a must-have for researchers in industry and academia, as well as those working in application-oriented plasma technology.